The effect of rotating transverse magnetic field on plasma parameters in capacitively coupled discharges

Anuravi Sharma and R Narayanan
Department of Energy Science and Engineering
Indian Institute of Technology Delhi, Hauz Khas, New Delhi-110 016, India
Dedicated to Prof P K Kaw

This paper presents the results of placing a set of permanent ring magnets in a direction perpendicular to the parallel plate electrodes of the rf plasma discharge chamber. The influence of static transverse magnetic field, i.e. parallel to the surface of electrodes on plasma parameters has been discussed. Based on the application under study, the process would require a desired ion flux with a directed and adjustable ion energy bombarding the substrate. For controlling these two parameters, one needs to control the plasma density and DC bias across the sheath which directly depends on the plasma profiles and power coupling mechanisms. The present work is mainly devoted to experimentally verifying the variation of plasma parameters as a function of discharge pressure and spatial variation to provide qualitative perception in understanding the role of transverse magnetic field in capacitive discharges. © Anita Publications. All rights reserved.
Doi: 10.54955/AJP.34.3-4.2025.223-235
Keywords: Rotating transverse magnetic field, Ring magnets, Electron gyrofrequency.

Peer Review Information
Method: Single- anonymous; Screened for Plagiarism? Yes
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