Asian Journal of Physics Vol. 34, Nos 3 & 4 (2025) 167-178

Gas flow rate influence on gas temperature regulation in a reinforced radio-frequency cross-field atmospheric pressure plasma jet

Radhika T P and Satyananda Kar
Department of Energy Science and Engineering,
Indian Institute of Technology Delhi, Hauz Khas, New Delhi-110 016, India
Dedicated to Prof P K Kaw


This study investigates the effect of gas flow rate on the gas temperature and discharge characteristics of a reinforced radio frequency cross-field atmospheric pressure plasma jet (APPJ) with an additional floating electrode. By introducing copper floating electrodes of varying widths, the plasma jet length, electron excitation temperature, electron density, and reactivity were enhanced. However, this enhancement was accompanied by an undesired rise in gas temperature, limiting the plasma’s application for heat-sensitive materials. To control this temperature rise, the gas flow rate varied from 1.5 to 9 lpm, showing a significant reduction in gas temperature from 438 K to 402 K as the flow rate increased, particularly at higher input powers. The study reveals that while an increase in gas flow rate initially improves ionization and reactivity by increasing electron excitation temperature and density, and then the insufficient input power for ionization at higher flow rates causes a decline in these parameters due to reduced ionization efficiency. Further optimization was achieved by increasing input power, which allowed better utilization of neutral atoms and improved plasma reactivity even at higher flow rates. The findings highlight the importance of tuning both gas flow rate and input power to maintain optimal plasma performance for various applications, particularly where controlled gas temperature and high reactivity are essential. © Anita Publications. All rights reserved.
Doi: 10.54955/AJP.34.3-4.2025.167-178
Keywords: Cold atmospheric pressure plasma, Atmospheric pressure plasma jet, Optical Emission spectroscopy.


Peer Review Information
Method: Single- anonymous; Screened for Plagiarism? Yes
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