Large volume plasma device-upgrade: A versatile plasma system for electron emitter, beam and wave based diagnostics

A K Sanyasi¹, P K Srivastava¹, Ayan Adhikari^1,2, L M Awasthi^1,2 and R Sugandhi^1,2
1Institute for Plasma Research, Bhat, Gandhinagar-382 428, India
²Homi Bhaba National Institute, Training School Complex, Anushaktinagar, Mumbai- 400 094, India
Dedicated to Prof B N Basu

General classification of vacuum electronic devices are mostly based on their construction and operational principles, associated with generation of waves from low to ultrahigh frequencies comprising of amplifiers, oscillators, electron emitters, etc. The devices are further classified with regard to their operation by applying magnetic field or without magnetic field. Moreover, almost every plasma system requires a proper vacuum device with vacuum requirements typically between ~10^–2 mbar to ~10^–9 mbar. Such systems also require a primary electron source (emitter) to initiate the plasma either by field emission or by emission induced impact ionization. In this paper, we describe large volume plasma device-Upgrade (LVPD-U) as a system which produces plasmas with filamentary emission. The plasma is magnetized for electrons and un-magnetized for ions (AR⁺) with the scale lengths for electron (re) and ion (ri) Larmor radii and follows the order (re << ri, L), L being the system size. The LVPD-U is fancied with several diagnostics viz. electrical and magnetic probes, microwave interferometry, in-vacuum gridded electron beam source, visible spectrometry, RF-based quadruple mass analyzers and thyrotron based exciter for high frequency wave excitation, etc. The system is further being equipped with high-power electron cyclotron resonators and LASER system. The paper highlights on LVPD-U as a large vacuum plasma device and its various diagnostics, coupled to facilitate plasma diagnosis. © Anita Publications. All rights reserved.
Keywords: Vacuum, Plasma, Electron Gun, Microwave.
doi.10.54955/AJP.32.9-12.2023.627-636

Peer Review Information
Method: Single- anonymous; Screened for Plagiarism? Yes
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